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magnetron sputtering titanium nitride system

The structure and properties of pulsed dc magnetron sputtered

Titanium nitride films used as an important electrode material for the design of alkali metal thermal-to-electric conversion (AMTEC) system have been prepared using dc (direct current) and asymmetric-bipolar pulsed dc magnetron sputtering. The pulse frequency and the duty cycle were varied from 5 to 50 kHz and 50 to

Surface morphology of titanium nitride thin films - De Gruyter

Biomedical Computer Systems, B?edzinska 39, 41-205 Sosnowiec, Poland In this paper the influence of temperature on the 3-D surface morphology of titanium nitride (TiN) thin films synthesized Keywords: atomic force microscopy (AFM); DC reactive magnetron sputtering; fractal analysis; surface roughness; titanium.

Deposition of titanium nitride thin films onto Silicon by - CiteSeerX

Jan 6, 2009 The TiN thin films were deposited by R.F. reactive planar magnetron sputtering from a high purity. Ti target onto Si (100). The reactive radiofrequency magnetron sputtering system “home made reactor” used in this experiment consists mainly of three sections as shown in Fig.1: deposition chamber, pumping

Antibacterial copper-containing titanium nitride films produced by

Mar 12, 2007 Antibacterial copper-containing titanium nitride films produced by dual magnetron sputtering commercial stainless steel using hybrid processes combining dual magnetron sputtering. The objective of this work is to In this work, a dual magnetron sputtering system is utilized to deposit copper-containing

Recent Developments in RF Magnetron Sputtered Thin Films - MDPI

Dec 1, 2014 sputtering system. Magnetron sputtering is now considered as the most effective process for the deposition of a wide range of thin film materials [36–40]. The main driving force sensors developed using R.F. magnetron sputtering mainly consist a metal-oxide or metal-nitride sensing electrode and a

Deposition of Titanium Nitride Thin Films onto Silicon by RF

Thin Films and Porous Materials: Deposition of Titanium Nitride Thin Films onto Silicon by RF Reactive Magnetron Sputtering. Space Resolved Optical Emission Spectroscopy During Deposition of BaxSr1-xTiO3 Thin Films by Double Hollow Cathode Plasma Jet System p.105 · Photoluminescence and Structural

Optimal Deposition Conditions of TiN Barrier Layers for the Growth

deposit stoichiometric TiN using dc reactive magnetron sputtering and evaluated the diffusion barrier of the sputtered TiN Keywords: Vertically aligned carbon nanofibers, Titanium Nitride, Diffusion, dc reactive sputtering, diffusion barrier layers:Presented in micronano system worshop conference held at Stock- holm,